SPIE Advanced Lithography 2009

SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography.

See presentations on:

  • Alternative Lithographic Technologies
  • Metrology, Inspection, and Process Control for Microlithography
  • Advances in Resist Materials and Processing Technology
  • Optical Microlithography
  • Design for Manufacturability through Design-Process Integration

22 – 27 February 2009
San Jose Convention Center and San Jose Marriott
San Jose, California, USA

source: http://spie.org/advanced-lithography.xml?WT.mc_id=RCALENDARW


~ by vascoteixeira on January 8, 2009.

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