International Symposium on Reactive Sputter Deposition, RSD2009

Call for Abstracts
International Symposium on Reactive Sputter Deposition RSD2009
10th/11th December 2009

Manchester Museum, The University of Manchester, UK

Web site: http://www.museum.manchester.ac.uk/

Email: RSD2009@mmu.ac.uk

Abstract Deadline:18th September 2009
Registration Deadline: 23rd October 2009
The Symposium on Reactive Sputter Deposition was established in 2000, providing a platform for discussing recent achievements in reactive sputter deposition and thin films among leading international scientists, engineers and students. The Symposium has developed to an annual tradition, being organised in the past years by the Belgian, Dutch and Austrian Vacuum Societies and held in Gent ( Belgium ), Delft (The Netherlands) and Leoben (Austria). This year it will take place in Manchester (UK) at the Manchester Museum (http://www.museum.manchester.ac.uk/)

Sponsored By:
Institute of Physics, Plasma Physics Group and Ion and Plasma Surface Interaction Group
Manchester Metropolitan University

This symposium will address:

1.New Developments in Reactive Sputtering: HIPIMS, pulsed reactive sputtering, process control, high rate sputtering, etc.
Invited speaker: Ralf Bandorf, IST Fraunhofer, ‘Alumina coatings deposited by HIPIMS’

2.Plasma diagnostics and Process Modelling: development of diagnostic techniques for reactive environments, reactive sputtering models, etc.
Invited speaker: Stanislav Mraz, RWTH Aachen University, ‘Negative ions in magnetron sputtering plasmas’

3.Film Growth and Characterisation: interrelationships between process parameters and film structures and properties, high resolution analytical techniques, etc.
Invited speaker: Wouter Leroy, University of Gent, ‘Linking reactive sputtering models to experimental reality by determining the real-time parameters’

4.Industrial Applications and Practice: industrial scale process control, new developments and applications, future trends and markets, system design, scale up issues, etc.
Invited speakers: Johannes Struempfel, Von Ardenne, ‘Industrial Magnetron Sputtering for Photovoltaic and Architectural Glass Coating’

The organising committee are seeking contributions under these (and related) headings. Please submit a 300-600 word abstract to RSD2009@mmu.ac.uk stating whether you would prefer an oral or poster presentation.
Selected papers will be published in Vacuum or Surface Engineering (subject to refereeing)

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~ by vascoteixeira on September 15, 2009.

 
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